Metrology of Nanostructures by Tomographic Mueller-Matrix Scatterometry
نویسندگان
چکیده
منابع مشابه
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Scanning Electron Microscopy (SEM) has been a mainstay of critical dimension (CD) metrology since the inception of integrated microelectronics, due to its inherent high resolution capability and relative ease of interpretation. However, as device dimensions continue to shrink, and non-planar devices become integrated into process flows (e.g., finFETs), the need to identify and develop successor...
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ژورنال
عنوان ژورنال: Applied Sciences
سال: 2018
ISSN: 2076-3417
DOI: 10.3390/app8122583